Vacuum deposition technologies, which respect the environment, are commonly used in many areas (electronics, automotive, aeronautics, health, etc.) because of the high purity and high density of layers and coatings that can be obtained. These thin layers (from 0.1 microns to a few tens of micrometers), have very advanced functional properties.

Principle of PVD deposits

CITRA possesses PVD/PECVD vacuum deposition machine whose general operating principle is:

 

  • A plasma gas (typically argon) is introduced in a chamber under high vacuum.

 

  • A plasma discharge is then created by negative polarization of a target made with the material to be deposited (cathode).
  • The ionized atoms contained in the plasma will bombard the target and eject its atoms on the substrate surface.

 

 

 

Ceramic coatings

To obtain a controlled stoichiometry ceramic, it is possible to introduce reactive gases into the chamber.

 

Range of coatings offered

CITRA offers a large range of different coatings:

 

  • Pure metals

 

  • Metallic alloys
  • Multilayered assemblies
  • Nitrides and carbides
  • Ceramics, DLC, etc.

 

 

The PVD / PECVD process therefore makes it possible to respond to many applications by improving:

 

  • Electrical properties to obtain a conductive coating (copper, aluminium, silver)

 

  • Wear and corrosion resistance (chromium, nickel and alloys), due to the extremely high density of the coatings
  • The very bright appearance of the coating