Principle of PVD deposits
CITRA possesses PVD/PECVD vacuum deposition machine whose general operating principle is:
- A plasma gas (typically argon) is introduced in a chamber under high vacuum.
- A plasma discharge is then created by negative polarization of a target made with the material to be deposited (cathode).
- The ionized atoms contained in the plasma will bombard the target and eject its atoms on the substrate surface.
To obtain a controlled stoichiometry ceramic, it is possible to introduce reactive gases into the chamber.
Range of coatings offered
CITRA offers a large range of different coatings:
- Pure metals
- Metallic alloys
- Multilayered assemblies
- Nitrides and carbides
- Ceramics, DLC, etc.
The PVD / PECVD process therefore makes it possible to respond to many applications by improving:
- Electrical properties to obtain a conductive coating (copper, aluminium, silver)
- Wear and corrosion resistance (chromium, nickel and alloys), due to the extremely high density of the coatings
- The very bright appearance of the coating