Principle of PVD deposits
CITRA has in its premises a vacuum deposition machine of PVD / PECVD type whose general operating principle is:
- In a chamber under high vacuum, a plasma gas (typically argon) is introduced.
- A plasma discharge is then created by negative polarization of a target made of the material to be deposited (cathode).
- The atoms of the gas thus ionized will bombard the target and spray it so that the atoms then torn off are deposited on the substrate.
To obtain a controlled stoichiometry ceramic, it is possible to introduce reactive gases into the chamber.
Range of coatings offered
CITRA offers a large range of different coatings:
- Pure metals
- Metallic alloys
- Nitrides and carbides
- Ceramics, DLC, etc.
The PVD / PECVD process therefore makes it possible to respond to many applications by improving:
- Electrical properties to obtain a conductive coating (copper, aluminum, silver)
- Resistance to wear and corrosion (chromium, nickel and alloys), due to the extremely high density of the deposits made;
- The very bright appearance of the coating, virgin of any pollution thanks to the vacuum.
Realizable coatings directly
|TiN||Abrasion resistance, low coefficient of friction||Cutting and forming tools, molds, matrices, decoration.|
|CrN||Hardness, oxidation resistance, low coefficient of friction||Hard chrome substitution, copper machining tools, metallurgy, plastics molds.|
|Amorphous carbone (DLC)||Low coefficient of friction, wear resistance, decoration||Valves, pistons, various axles, prostheses, jewelery|
|Metals (Ti, Cr, Cu, Ag, Al)||Conductivity, undercoat||Electrical Properties, Decoration|
Coatings requiring specific placement
|Ti(X,Y)N, Ti(X)CN||Resistance to heat (800 ° C) and oxidation||Machining tools (titanium, aluminum, nickel, steels), protection of molds.|